Used to measure the overall leakage from the entire workpiece.
Atmospheric pressure chamber method in which the workpiece is covered with a chamber, tracer gas is sealed inside the workpiece, the leaking gas is deposited inside the chamber, the leaking gas is agitated and forced to circulate, and the gas concentration is measured with a hydrogen detector. After the chamber is vacunming , air is supplied into the chamber to direct the leaked gas to the hydrogen detector for highly sensitive measurment.
Compact and lightweight design that is easy to mount in the equipment. It has a structure that makes it easy to mount it close to the product or chamber.
In addition, the concentration density decomposition capability is ultra-sensitive down to 0.1 ppm (depending on setting and environmental conditions).
| Detection Principle | Semiconductor Type |
|---|---|
| Detection Sensitivity | 1×10⁻⁶Pa･m³/s (equivalent to) ＊Depends on inspection conditions and measurement environment |
| Usage Method | Equipment built-in type (exclusively for equipment built-in) |
| Resolution | 0.1 ppm |
| Power supply | DC 24 V |
| External Dimensions (Unit: mm) | W93×D91×H97 |